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October 13-16, 2025

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  2. ICALEO 2024
  3. ICALEO 2023
  4. Laser Materials Microprocessing
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Poster Gallery

Presentation Search

Day Title
Tuesday Dopant Activation Annealing of Si Using CW Laser of 532 NM
Tuesday Influence of Process Parameters in NiTi Shape Memory Alloy - A Study for Surface Integrity and Topography for Biomedical Applications.
Tuesday Analysis of Flat-Top Nanosecond Green Laser Annealing Process for Semiconductor Si Wafers
Tuesday UV Picosecond Laser Drilling of ABF Material for Printed Circuit Boards Using Laser Burst Mode and Beam Shaping
Tuesday Surface Morphology and Ablation Threshold of Titanium in Air and Water Irradiated by Nd:YAG Laser
Tuesday UV-Femtosecond-Laser Structuring of Silicon Carbide
Tuesday Antibacterial Effect of Periodic Structure Formed on SUS430 by Using Nanosecond Pulsed Laser
Tuesday UV-Ultrashort Pulsed Laser Ablation of Fused Silica
Tuesday Resonant Mirror Based Laser Direct Lithography
Tuesday Water and Oil Wettability Customization by Tailoring Micro-Structured Polymers
LIA - The Laser Institute 
12001 Research Pkwy, Suite 210     
Orlando, FL 32826     
Toll-Free: 800.345.2737     
International: +1.407.380.1553