Skip to main content
Home

Orlando, FL
November 1-4, 2027

Subscribe for Updates

Main navigation

  • Home
  • Program
    • Program Overview
    • Past Programs (Archive)
  • Sponsor & Exhibit
  • Awards
    • Industry Awards Overview
    • Arthur L. Schawlow Award
    • William M. Steen Award
    • LIA Fellow Award
    • JLA Best Paper Award
    • Student Paper and Poster Awards
  • Subscribe
/ Program 43rd Annual ICALEO Laser Materials Microprocessing Poster Gallery

You're viewing the program for 43rd Annual ICALEO (2024), a prior year.

Go to 45th Annual ICALEO (2026) → All program years

Poster Gallery

Presentation Search

* Program subject to change.
Day Title
Tuesday Double-Pulse Laser Peening as a Surface Enhancement Technology
Tuesday Comparative Study of Single-Beam and Dual-Beam Laser Annealing for Dopant Activation Process
Tuesday Development of a Laser-based Process to Produce a Hermetically Sealed Contacting Interface for the Encapsulation of Temperature-sensitive Electronic Components
Tuesday Surface Characterization of Surface Nanostructures Fabricated by Femtosecond Laser Pulses in GHz Burst Mode
Tuesday Comparing Novel Chip Singulation Techniques for Silicon Carbide
Tuesday Analysis of Nanosecond-Scale Temperature Sensing Technology for Flat-Top Nanosecond Green Laser Annealing Process of Semiconductor Si Wafers
LIA - The Laser Institute 
12001 Research Pkwy, Suite 210     
Orlando, FL 32826     
Toll-Free: 800.345.2737     
International: +1.407.380.1553